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Precise Vacuum Control for Semiconductor Industry
In semiconductor manufacturing, our vacuum control products play a major role in various process steps and ensure precise control of the vacuum conditions that are essential for the production of electronic devices. Throughout all process steps, our Vacuum Gauges and Controllers ensure the integrity and reliability of semiconductor manufacturing, contributing to the production of high-quality electronic devices that power our modern world.
Crystal Pulling
In crystal pulling, where flawless silicon crystals are grown, our Capacitance Vacuum Gauge family controls the process pressure within the pulling chambers. This precise pressure control is essential for achieving optimal crystal growth and contributes to the quality and purity of semiconductor materials.
Oxidation/Gate Dielectrics and Ion Implanting
In processes such as oxidation/gate dielectrics and ion implantation, our vacuum control products ensure a stable vacuum environment. The Capacitance Vacuum Gauge family monitors process pressure, while the Pirani Gauges and Cold Cathodes Gauges provide system-wide pressure control. This careful regulation is critical to achieving the desired material properties and doping accuracy that are essential for semiconductor device performance.
Lithography
In lithography, our vacuum control solutions, including Capacitance Gauges and Pirani Gauges, along with Hot Ion Gauges and Cold Cathodes, enable precise pressure control within process systems. Vacuum Components ensure leak-free connections, contributing to the stability and accuracy of lithography processes.
Etch
In etching processes, our Vacuum Gauges and Controllers, specifically the Capacitance Gauges, regulate process pressure to enable precise material removal. System-wide pressure control is achieved through a combination of Capacitance and Pirani Gauges along with Hot Ion Gauges and Cold Cathodes that ensure consistent etching and high process repeatability. Also the optical gas analysis device Augent® OPG550 is employed to monitor the composition of gases used during etching. This helps ensure process stability and precise material removal.
CVD, PVD, ALD, EPI and RTP
In processes such as CVD, PVD, ALD, EPI and RTP, our vacuum control products play a critical role in regulating process pressure and ensuring precise material deposition and development. The Capacitance Vacuum Gauge family monitors process pressure, while Hot Ion Gauges, Cold Cathodes and Vacuum Fittings contribute to stable system pressure control, improving process uniformity and equipment performance. Our optical gas analyzer Augent® OPG550 monitors gas composition during material deposition, ensuring optimal conditions.
